@Article{TanUDRBTDI:2004:TrPoPl,
author = "Tan, Ing Hwie and Ueda, M{\'a}rio and Dallaqua, Renato
S{\'e}rgio and Rossi, Jos{\'e} Osvaldo and Beloto, Ant{\^o}nio
Fernando and Tabacniks, M. H. and Dermaquette, N. R. and Inoue,
Y.",
affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de
Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas
Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais
(INPE)} and {Instituto de F{\'{\i}}sica da USP} and {Escola
Polit{\'e}cnica da USP} and {Nagoya University}",
title = "Treatment of polymers by plasma immersion ion implantation for
space applications",
journal = "Surface and Coatings Technology",
year = "2004",
volume = "186",
number = "1-2",
pages = "234--238",
month = "Aug.",
note = "{7th International Workshop on Plasma-Based Ion Implantation}",
keywords = "plasma immersion, aluminum implantation, RBS.",
abstract = "Kapton samples were implanted with aluminum in order to create a
metal oxide layer for protection against atomic oxygen degradation
in space environment. Three different approaches were used. First,
an aluminum plasma was created by vacuum are discharge in a
magnetic field, and samples were implanted by plasma immersion.
Although sample charging charging problems prevented implantation
at significant depths, an ion mixing layer was formed, as shown by
X-ray Photoelectron Spectroscopy (XPS) depth profile analysis,
giving superior adhesion of the aluminum film to the substrate. In
a second approach, a 20-nn amuminum film was deposited on a Kapton
sample by electron beam, followed by nitrogen plasma immersion ion
implantation. Rutherford Backscattering Spectroscopy (RSB)
analysis did not show significant recoil implantation of aluminum,
and the process resulted in a cracked film, possibly due to the
formation of a estressed aluminum nitride layer. In a third
approach, direct aluminum implantation by plasma immersion was
made without a confing magnetic field. Charging problems are
minimized in this low-density plasma, but an increase of a factor
of 10 in treatment time was not enough to compensate the much
lower dose implanted per pulse. This was reveales by oxygen
degradation tests made by submitting the treated samples to RF
oxygen plasmas and measuring the mass loss. The sample implanted
in magnetically confined palsmas conserved its transparency and
had negligible mass loss. Unconfined plasmas also resulted in a
degradation protection layer but only in small patches of the
substrate since the low dose and possibly a misalignment resulted
in poor uniformity. Thermal transients followed by adhesion tests
showed that direct implantation gives the necessary adhesion of
the protective layer in order to withstand the harsh space
environment.",
copyholder = "SID/SCD",
doi = "10.1016/j.surfcoat.2004.04.029",
url = "http://dx.doi.org/10.1016/j.surfcoat.2004.04.029",
issn = "0257-8972",
language = "en",
targetfile = "1-s2.0-S0257897204002749-main.pdf",
urlaccessdate = "20 maio 2024"
}